Photoresist for UV Laser Direct Writing (GRX Series)

In the recent rapid progress of manufacturing ultra-fine semiconductors and flat panels, the processes are increasingly diversified. The ability to rapidly develop suitable materials is needed. We are developing a characteristic photoresists (photosensitive materials) for lift-off processing. Lift-off processing has the advantage of eliminating a metal etching process for wiring, thus contributing to shortening the process time and reducing the amount of material used. We also offer consultation on material development to meet our customers’ individual needs and detailed requirements. Contact us for more information.

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Applications & Uses:

Exposure wavelength range: g-line to i-line (broadband compatible) Suitable for laser writing.

Benefits:

Ensuring coating performance with a spin coater and capillary coater used. Good coating performance on large glass substrates.
Organic and inorganic alkaline development possible.
The optimized material composition has improved the in-plane uniformity of line widths on large glass substrates during direct laser writing.
Improved metal etching performance by optimizing the pattern profile
Excellent adhesion on the substrate with low side etching
Easy to be cleaned up

Manufacturer:

Nagase ChemteX Corporation

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Improving the Shelf Life of Bakery Products

Improving Shelf Life of Bakery Products

Creating Clean Beauty Upcycled Materials

Doing More With Less: Heat-Resistant Resin Molds

Creating Specialty Alignment Tools

Andretti Formula E Partnership

Improving the Shelf Life of Bakery Products

Nagase Viita receives EcoVadis Platinum rating

Andretti Formula E Partnership

New Year’s Message from President & CEO

Excellent Healthful Management Corp

Andretti Formula E Partnership

Denacol™ White Paper

Basics of Cationic Curing

Improving the Shelf Life of Bakery Products

Photoresist for UV Laser Direct Writing (GRX Series)

Applications & Uses:

Benefits:

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Related Products

Under Layer Material for Bi-layer Lift-off Processing (BLX Series)

Photoresist for Single Layer Lift-off Processing (NPR Series)

Photoresist for UV Laser Direct Writing (GRX Series)

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