Stripper for FPD (N-342)

Semiconductor devices are becoming increasingly ultra-fine, and flat panel displays are becoming increasingly high-definition and highly functional. Photoresist (light sensitive material) and resist stripping agent (which require rapid development capabilities) are used in the ever advancing world of semiconductor and flat panel display manufacturing.

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1267327926

Applications & Uses:

FPD

Benefits:

High positive removal capability
Especially high residue removal capability
High Al Corrosivity

Manufacturer:

Nagase ChemteX Corporation

Chemical Properties:

Chemical Property:	Water based liquid
Rince liquid:	Water 10mPa・s(25℃)
Usage Condition:	R.T.~50℃/1~5min.

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