Chemical Property: | Not Water based liquid |
---|---|
Rince liquid: | Organic Solvent |
Viscosity: | 3mPa・s(25℃) |
Usage Condition: | 80~100℃/10~20min. |
Photoresist and resist stripping agents used in the manufacturing of semiconductors and flat panel displays.
Learn MorePhotoresist and resist stripping agents used in the manufacturing of semiconductors and flat panel displays.
Learn MorePhotoresist and resist stripping agents used in the manufacturing of semiconductors and flat panel displays.
Learn MorePhotoresist and resist stripping agents used in the manufacturing of semiconductors and flat panel displays.
Learn MorePhotoresist and resist stripping agents used in the manufacturing of semiconductors and flat panel displays.
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